Linearity and enhanced sensitivity of the Shipley AZ-1350B photoresist.
نویسندگان
چکیده
The properties of the Shipley AZ-1350B positive photoresist used with the Shipley AZ-303A developer were investigated. It was found that the use of AZ-303A developer results in a significant improvement of the sensitivity and the linearity of the photoresist. The unexposed etch rate of the photoresist was 35 A +/- 5 A/sec. Gratings of high efficiency have been successfully fabricated using the above combination of photoresist and developer.
منابع مشابه
Design of High Sensitivity and Linearity Microelectromechanical Systems Capacitive Tire Pressure Sensor using Stepped Membrane
This paper is focused on a novel design of stepped diaphragm for MEMS capacitive pressure sensor used in tire pressure monitoring system. The structure of sensor diaphragm plays a key role for determining the sensitivity of the sensor and the non-linearity of the output.First the structures of two capacitive pressure sensors with clamped square flatdiaphragms, with different thicknesses are inv...
متن کاملMathematical analysis of soft baking in photolithography
The soft baking step of a photolithography process is analyzed theoretically, taking the effect of the temperature dependence of the diffusivity of solvent into account. A coordinates-transform technique is chosen to solve the moving boundary problem under consideration. The temporal variation of the thickness of a film is predicted, and the result obtained justified by fitting experimental dat...
متن کاملTapered Optical Fiber Coated with ZnO Nanorods for Detection of Ethanol Concentration in Water
This work presents ZnO nanorods coated multimode optical fiber sensing behavior in response to ethanol solution. The sensor operates based on modulation of light intensity which arises from manipulation of light interaction with the ambient environment in sensing region. For this purpose, two steps are experimentally applied here; etching and then coating fiber with ZnO nanorods to provide stro...
متن کاملReleasing high aspect ratio SU-8 microstructures using AZ photoresist as a sacrificial layer on metallized Si substrates
This paper presents a successful method for releasing high aspect ratio SU-8 micro-structures by the use of positive photoresist (AZ 4620) as sacrificial layer. The AZ 4620 photoresist sacrificial layer was dissolved by the SU-8 developer (propylene glycol monomethyl ether acetate). Thus, this process reduces the need for complex microfabrication steps and equipments which are otherwise require...
متن کاملParallel optical nanolithography using nanoscale bowtie aperture array.
We report results of parallel optical nanolithography using nanoscale bowtie aperture array. These nanoscale bowtie aperture arrays are used to focus a laser beam into multiple nanoscale light spots for parallel nano-lithography. Our work employed a frequency-tripled diode-pumped solid state (DPSS) laser (lambda = 355 nm) and Shipley S1805 photoresist. An interference-based optical alignment sy...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید
ثبت ناماگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید
ورودعنوان ژورنال:
- Applied optics
دوره 16 6 شماره
صفحات -
تاریخ انتشار 1977